A Photocurable Poly(dimethylsiloxane) Chemistry Designed for Soft Lithographic Molding and Printing in the Nanometer Regime
Author:
Affiliation:
1. Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/ja029973k
Reference4 articles.
1. Unconventional Methods for Fabricating and Patterning Nanostructures
2. Siloxane Polymers for High-Resolution, High-Accuracy Soft Lithography
3. Improved Pattern Transfer in Soft Lithography Using Composite Stamps
4. Paper-like electronic displays: Large-area rubber-stamped plastic sheets of electronics and microencapsulated electrophoretic inks
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