Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces
Author:
Affiliation:
1. Department of Chemistry, University of California, Riverside, California 92521
2. Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 102138
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm9027447
Reference46 articles.
1. AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing
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