Deposition of Copper Films with Surface-Activating Agents
Author:
Affiliation:
1. Central Research and Development Department, E. I. du Pont de Nemours and Company, Wilmington, Delaware 19880-0500, United States
Publisher
American Chemical Society (ACS)
Subject
Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/om3005383
Reference58 articles.
1. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
2. Ritala, M.; Leskelä, M.InHandbook of Thin Film Materials Vol. 1;Nalwa, H. S., Ed.Academic Press:San Diego, 2001; p103.
3. The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing
4. Atomic layer deposition (ALD): from precursors to thin film structures
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Low-Symmetry β-Diketimine Aryloxide Rare-Earth Complexes: Flexible, Reactive, and Selective;Inorganic Chemistry;2020-09-28
2. Atomic layer deposition of metals: Precursors and film growth;Applied Physics Reviews;2019-12
3. Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper;Dalton Transactions;2015
4. MOCVD growth and study of magnetic Co films;Surface Engineering;2014-11-27
5. Ferrocene-based sulfonyl dihydropyrazole derivatives: Synthesis, structure, electrochemistry and effect on thermal decomposition of NH4ClO4;Journal of Molecular Structure;2014-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3