Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper-Reference-Cited by-同舟云学术

Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper

Published:2015 Issue:22 Volume:44 Page:10188-10199
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Dey Gangotri¹²³⁴,Wrench Jacqueline S.⁵⁶⁷⁸,Hagen Dirk J.¹²³⁴,Keeney Lynette¹²³⁴,Elliott Simon D.¹²³⁴

Affiliation:

1. Tyndall National Institute

2. University College Cork

3. Cork

4. Ireland

5. University of Liverpool

6. School of Engineering

7. Liverpool

8. UK

Abstract

We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors.

Funder

Science Foundation Ireland

Irish Research Council for Science, Engineering and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/DT/C5DT00922G

Reference78 articles.

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