Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems-Reference-Cited by-同舟云学术

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

Author:

Rathore Ashish¹²^ORCID,Pollentier Ivan²,Cipriani Maicol³,Singh Harpreet⁴,De Simone Danilo²,Ingólfsson Oddur³^ORCID,De Gendt Stefan¹²

Affiliation:

1. Department of Chemistry, KU Leuven, Celestijnenlaan 200F, 3001 Leuven, Belgium

2. IMEC, Kapeldreef 75, 3001 Leuven, Belgium

3. Science Institute and Department of Chemistry, University of Iceland, Dunhagi 3, 107 Reykjavik, Iceland

4. Centre for Nanoscience and Nanotechnology, Panjab University, 160014 Chandigarh, India

Funder

H2020 Marie Sklodowska-Curie Actions

University of Iceland Research Fund

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry,Polymers and Plastics,Process Chemistry and Technology

Link

Reference47 articles.

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