Author:
Narasimhan Amrit,Grzeskowiak Steven,Ostrander Jonathan,Schad Jonathon,Rebeyev Eliran,Neisser Mark,Ocola Leonidas E.,Denbeaux Gregory,Brainard Robert L.
Reference20 articles.
1. Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling
2. Secondary Electrons in EUV Lithography,;Torok,2013
3. Negative-ion formation in electron-stimulated desorption of CF2Cl2 adsorbed on Ru (0001).;Lu,1998
4. Total cross sections for dissociative electron attachment in dichloroalkanes and selected polychloroalkanes: The correlation with vertical attachment energies.;Aflatooni,2000
5. Radiation chemistry in chemically amplified resists.;Kozawa,2010
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