Preparation and Structural Investigation of Ultra-Uniform Mo Films on a Si/SiO<sub>2</sub> Wafer by the Direct-Current Magnetron Sputtering Method-Reference-Cited by-同舟云学术

Preparation and Structural Investigation of Ultra-Uniform Mo Films on a Si/SiO₂ Wafer by the Direct-Current Magnetron Sputtering Method

Author:

Cheng Zhengwang¹²³^ORCID,Wang Aobo¹²,Bo Huating¹²,Wang Mei¹²³^ORCID,He Jing¹²³,Zou Wei¹²³,Ma Xinguo¹²³^ORCID

Affiliation:

1. School of Science, Hubei University of Technology, Wuhan430068, China

2. School of Chip Industry, Hubei University of Technology, Wuhan430068, China

3. National “111 Research Center” Microelectronics and Integrated Circuits, Hubei University of Technology, Wuhan430068, China

Funder

Hubei University of Technology

Hubei Provincial Department of Education

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

Reference36 articles.

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