Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy
Author:
Affiliation:
1. Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Drive, Gaithersburg, Maryland 20899
2. SEMATECH, 2706 Montopolis Drive, Austin, Texas 78741
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma062579c
Reference29 articles.
1. Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
2. Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography
3. Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
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