Synthesis of chemically amplified photoresist polymer containing four (Meth)acrylate monomers via RAFT polymerization and its application for KrF lithography-Reference-Cited by-同舟云学术

Synthesis of chemically amplified photoresist polymer containing four (Meth)acrylate monomers via RAFT polymerization and its application for KrF lithography

Published:2016-04-28 Issue:5 Volume:23 Page:
ISSN:1022-9760
Container-title:Journal of Polymer Research
language:en
Short-container-title:J Polym Res

Author:

Li Hu,Liu Jingcheng,Zheng Xiangfei,Ji Changwei,Mu Qidao,Liu Ren,Liu Xiaoya

Funder

Innovation Foundation of Jiangsu

National Science and Technology Major Project of China

Jiangsu Postgraduate Scientific Research and Innovation Plan Project

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://link.springer.com/content/pdf/10.1007/s10965-016-0996-3.pdf

Reference39 articles.

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4. Henderson CL (2012) Polym Sci: Comprehen Ref 8:37–76

5. Conley W, Garza C (2011) Photochemistry 38:369–387

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