Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods-Reference-Cited by-同舟云学术

Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods

Author:

Farrell Richard A.¹²³,Petkov Nikolay³⁴,Shaw Matthew T.²⁵,Djara Vladimir³,Holmes Justin D.¹²³,Morris Michael A.¹²³

Affiliation:

1. Materials and Supercritical Fluid Group, Department of Chemistry, University College Cork, Cork, Ireland

2. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland

3. Micro-Nano Electronics Centre, Tyndall National Institute, Lee Matings, Prospect Row, Cork, Ireland

4. Electron Microscopy and Analysis Facility (EMAF), Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland

5. Intel Ireland limited, Collinstown Industrial Estate, Leixlip, Co. Kildare, Ireland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

Reference28 articles.

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