Selective Sidewall Wetting of Polymer Blocks in Hydrogen Silsesquioxane Directed Self-Assembly of PS-b-PDMS-Reference-Cited by-同舟云学术

Selective Sidewall Wetting of Polymer Blocks in Hydrogen Silsesquioxane Directed Self-Assembly of PS-b-PDMS

Published:2012-08-16 Issue:9 Volume:4 Page:4637-4642
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Hobbs Richard G.¹²,Farrell Richard A.¹²,Bolger Ciara T.¹²,Kelly Roisin A.¹²,Morris Michael A.¹²,Petkov Nikolay¹²,Holmes Justin D.¹²

Affiliation:

1. Materials Chemistry and Analysis Group, Department of Chemistry and the Tyndall National Institute, University College Cork, Cork, Ireland

2. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am301012p

Reference23 articles.

1. International Technology Roadmap for Semiconductors: 2010 Update Overview;http://www.itrs.net/Links/2010ITRS/2010Update/ToPost/2010_Update_Overview.pdf.

2. Is Silicon's Reign Nearing Its End?

3. Lithography and Other Patterning Techniques for Future Electronics

4. Immersion Lithography: Photomask and Wafer-Level Materials

5. Semiconductor Nanowire Fabrication by Bottom-Up and Top-Down Paradigms

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