Selective Doping of Silicon Nanowires by Means of Electron Beam Stimulated Oxide Etching
Author:
Affiliation:
1. Dipartimento di Ingegneria della Informazione, Università di Pisa, Via G.Caruso, I-56122 Pisa, Italy
2. IEIIT - Pisa, CNR, Via G.Caruso, I-56122 Pisa, Italy
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl2045183
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