Electron Beam Lithography on Irregular Surface Using Grafted PMMA Monolayer as Resist-Reference-Cited by-同舟云学术

Electron Beam Lithography on Irregular Surface Using Grafted PMMA Monolayer as Resist

Published:2016-11-28 Issue:3 Volume:4 Page:1600780
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Dey Ripon Kumar¹,Aydinoglu Ferhat¹,Cui Bo¹

Affiliation:

1. Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN); University of Waterloo; 200 University Ave. West Waterloo ON N2L 3G1 Canada

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference41 articles.

1. Nanofabrication Techniques Applied to the Development of Novel Optical Fiber Sensors Based on Nanostructured Coatings

2. SOFT LITHOGRAPHY

3. Enhanced Adhesion by Gecko-Inspired Hierarchical Fibrillar Adhesives

4. A hemispherical electronic eye camera based on compressible silicon optoelectronics

5. Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron beam lithography on nonplanar and irregular surfaces;Microsystems & Nanoengineering;2024-04-19

2. Edge lithography based on aluminum dry etching;Micro and Nano Engineering;2024-03

3. Electron beam lithography on non-planar, suspended, 3D AFM cantilever for nanoscale thermal probing;Nano Futures;2022-06-01

4. Effect of the Al2O3 Deposition Method on Parylene C: Highlights on a Nanopillar-Shaped Surface;ACS Omega;2020-06-24

5. Recent progress in creating complex and multiplexed surface-grafted macromolecular architectures;Soft Matter;2020