Electrochemical Cu Growth on MPS-Modified Au(111) Electrodes-Reference-Cited by-同舟云学术

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Electrochemical Cu Growth on MPS-Modified Au(111) Electrodes

Published:2012-08-10 Issue:33 Volume:116 Page:17507-17517
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Krug Klaus¹,Liu Yung-Fang¹,Ho Wen-Hsiang¹,Lee Yuh-Lang¹,Dow Wei-Ping²,Yau Shueh-Lin³

Affiliation:

1. Department of Chemical Engineering, National Cheng Kung University, Tainan 70101, Taiwan

2. Department of Chemical Engineering, National Chung Hsing University, Taichung 40227, Taiwan

3. Department of Chemistry, National Central University, Jhong-Li, Tao-Yuan 32001, Taiwan

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp302406e

Reference56 articles.

1. The chemistry of additives in damascene copper plating

2. In Situ EC-STM Studies of MPS, SPS, and Chloride on Cu(100): Structural Studies of Accelerators for Dual Damascene Electrodeposition

3. Accelerator Surface Phase Associated with Superconformal Cu Electrodeposition

4. Interactions of Chloride and 3-Mercapto-1-Propanesulfonic Acid in Acidic Copper Sulfate Electrolyte

5. The chemistry of the additives in an acid copper electroplating bath

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1. Effects of DPS on Surface Roughness and Mechanical Properties of Electrodeposited Copper Foils;Crystal Research and Technology;2023-08-16

2. Contrasts in Copper Deposition on Pt(111) Modified by 1-Mercaptopropionic and 1-Mercaptoacetic Acids as Probed by Voltammetry and STM;Journal of The Electrochemical Society;2018

3. Self-assembled monolayers of sulfonate-terminated alkanethiols investigated by frequency modulation atomic force microscopy in liquid;Nanotechnology;2017-10-17

4. Voltammetric Observation of Transient Catalytic Behavior of SPS in Copper Electrodeposition—Its Interaction with Cuprous Ion from Comproportionation;Journal of The Electrochemical Society;2016

5. 3-Mercapto-1-Propanesulfonate for Cu Electrodeposition Studied by in Situ Shell-Isolated Nanoparticle-Enhanced Raman Spectroscopy, Density Functional Theory Calculations, and Cyclic Voltammetry;The Journal of Physical Chemistry C;2015-10-05

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