Area-Selective Atomic Layer Deposition of Lead Sulfide: Nanoscale Patterning and DFT Simulations
Author:
Affiliation:
1. Department of Mechanical Engineering
2. Department of Chemical Engineering
3. Department of Materials and Science Engineering
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la904122e
Reference45 articles.
1. Characterization of vacuum evaporated PbS thin films
2. Lead Salt Quantum Dots: the Limit of Strong Quantum Confinement
3. Nucleation and Growth of Lead Sulfide Nano- and Microcrystallites in Supramolecular Polymer Assemblies
4. Photoelectrochemical activities of ultrathin lead sulfide films prepared by electrochemical atomic layer epitaxy
5. Highly Efficient Multiple Exciton Generation in Colloidal PbSe and PbS Quantum Dots
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