Area-selective atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> using inkjet-printed inhibition patterns and lift-off process-Reference-Cited by-同舟云学术

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Area-selective atomic layer deposition of Al₂O₃ using inkjet-printed inhibition patterns and lift-off process

Published:2023-03-19 Issue:3 Volume:24 Page:215-225
ISSN:1598-0316
Container-title:Journal of Information Display
language:en
Short-container-title:Journal of Information Display

Author:

Yu Jun Ho¹,Cho Young–In¹²,Lee Jae–Wook³,Choi Kyung Hyun³,Lee Sang–Ho¹

Affiliation:

1. Digital Transformation R&D Department, Korea Institute of Industrial Technology, Cheonan-si, South Korea

2. Department of Material Engineering, Han–yang University, Seoul, South Korea

3. Department of Mechatronics Engineering, Jeju University, Jeju-si, South Korea

Funder

National Research Foundation

Korean government

Publisher

Informa UK Limited

Subject

Electrical and Electronic Engineering,General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1080/15980316.2023.2189079

Reference35 articles.

1. Atomic layer deposition (ALD): from precursors to thin film structures

2. Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning

3. The use of atomic layer deposition in advanced nanopatterning

4. Area-Selective Atomic Layer Deposition of Lead Sulfide: Nanoscale Patterning and DFT Simulations

5. Area-Selective Atomic Layer Deposition Using an Inductively Coupled Plasma Polymerized Fluorocarbon Layer: A Case Study for Metal Oxides

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. All-printed 3-dimensional micro-supercapacitors with homogeneous Ag interface: Achieving precision on curved surfaces through Electrohydrodynamic jet printing;Chemical Engineering Journal;2024-10

2. Advanced IGZO Phototransistor Arrays: Enhancing Visible Light Detection Through Selectively Electrohydrodynamic Jet‐Printed Photocatalytic Layer Formation;Advanced Functional Materials;2024-05-10

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