Soft Removal of Stearic Acid Self-Assembled Monolayer for Area-Selective Atomic Layer Deposition
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Publisher
Elsevier BV
Reference54 articles.
1. Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu;D Bobb-Semple;Chemistry of Materials,2019
2. Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition;T L Liu;ACS Appl Mater Interfaces,2020
3. Understanding the impact of Cu surface pretreatment on Octadecanethiol-derived self-assembled monolayer as a mask for areaselective deposition;M Pasquali;Appl Surf Sci,2021
4. Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns;F S Hashemi;ACS Appl Mater Interfaces,2016
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