Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene-Reference-Cited by-同舟云学术

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Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

Published:1994-03-01 Issue:3 Volume:6 Page:287-294
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Uhrich K. E.,Reichmanis E.,Heffner S. A.,Kometani J. M.,Nalamasu O.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00039a007

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation and self-assembly of two-length-scale A-b-(B-b-A)n-b-B multiblock copolymers;Soft Matter;2012

2. SYNTHESIS AND RADICAL POLYMERIZATION OF BIFUNCTIONAL MALEIMIDES WITH DIFFERENT FUNCTIONAL REACTIVITIES;Journal of Macromolecular Science, Part A;2000-01-18

3. Application of dichromated gelatin for dry developed lithographic techniques on GaAs;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

4. Demonstration of a Directly Photopatternable Spin-On-Glass Based on Hydrogen Silsesquioxane and Photobase Generators;Macromolecules;1998-07-01

5. Photogenerated Base in Polymer Curing and Imaging: Cross-Linking of Base-Sensitive Polymers Containing Enolizable Pendant Groups;Chemistry of Materials;1997-12-01

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