Photogenerated Base in Polymer Curing and Imaging: Cross-Linking of Base-Sensitive Polymers Containing Enolizable Pendant Groups
Author:
Affiliation:
1. Department of Chemistry, Baker Laboratory, Cornell University, Ithaca, New York 14850-1301 and Department of Chemistry, University of California, Berkeley, California 94720-1460
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm9702068
Reference24 articles.
1. Willson, C. G.Introduction to Microlithography, 2nd ed.; Thompson, L. F., Willson, C. G.; Bowden, M. J., Eds.; American Chemical Society: Washington, DC, 1994; pp 139−268. Reiser, A.Photoreactive Polymers: TheScience and Technology of Resists; John Wiley & Sons: New York, 1989.
2. Diaryliodonium Salts. A New Class of Photoinitiators for Cationic Polymerization
3. Novolak-Diazoquinone Resists: The Imaging Systems of the Computer Chip
4. Chemical Amplification in High-Resolution Imaging Systems
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