Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films-Reference-Cited by-同舟云学术

Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

Published:2008-11-11 Issue:23 Volume:41 Page:9098-9103
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Ji Shengxiang¹,Liu Chi-Chun¹,Son Jeong Gon¹,Gotrik Kevin¹,Craig Gordon S. W.¹,Gopalan Padma¹,Himpsel F. J.¹,Char Kookheon¹,Nealey Paul F.¹

Affiliation:

1. Departments of Chemical and Biological Engineering, Physics, and Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706 and Department of Chemical and Biological Engineering, Seoul National University, Seoul, South Korea 400-004

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma801861h

Reference51 articles.

1. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication

2. Self-aligned self assembly of multi-nanowire silicon field effect transistors

3. Nanoscale patterning using self-assembled polymers for semiconductor applications

4. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

5. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

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