Localized Electrothermal Annealing with Nanowatt Power for a Silicon Nanowire Field-Effect Transistor
Author:
Affiliation:
1. School of Electrical Engineering, KAIST, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
2. Department of Memory Business, Samsung Electronics, 1-1 Samsungjeonja-ro, Hwasung-si 18448, Republic of Korea
Funder
National Research Foundation of Korea
Ministry of Science, ICT and Future Planning
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.7b17794
Reference15 articles.
1. Rapid thermal annealing of ion‐implanted semiconductors
2. Poate, J. M.; Mayer, J. W., Eds. InLaser Annealing of Semiconductors,1st ed.Academic Press:Cambridge, MA, 1982; pp1–245.
3. Self-Curable Gate-All-Around MOSFETs Using Electrical Annealing to Repair Degradation Induced From Hot-Carrier Injection
4. Radically extending the cycling endurance of Flash memory (to > 100M Cycles) by using built-in thermal annealing to self-heal the stress-induced damage
5. A new saw-like self-recovery of interface states in nitride-based memory cell
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