Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography
Author:
Affiliation:
1. Materials Engineering Division and ‡Materials Science Division, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550, United States
Funder
Lawrence Livermore National Laboratory
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.7b12654
Reference50 articles.
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4. Three-dimensional microfabrication with two-photon-absorbed photopolymerization
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