Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography-Reference-Cited by-同舟云学术

Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography

Published:2017-12-07 Issue:1 Volume:10 Page:1164-1172
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Saha Sourabh K.¹^ORCID,Oakdale James S.¹,Cuadra Jefferson A.¹,Divin Chuck¹,Ye Jianchao¹,Forien Jean-Baptiste¹,Bayu Aji Leonardus B.¹,Biener Juergen¹,Smith William L.¹

Affiliation:

1. Materials Engineering Division and ‡Materials Science Division, Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550, United States

Funder

Lawrence Livermore National Laboratory

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b12654

Reference50 articles.

1. Advances in 3D nano/microfabrication using two-photon initiated polymerization

2. Two-photon laser precision microfabrication and its applications to micro-nano devices and systems

3. Two-photon polymerisation for three-dimensional micro-fabrication

4. Three-dimensional microfabrication with two-photon-absorbed photopolymerization

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