Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Author:

Wang Hao123,Zhang Wang1,Ladika Dimitra45,Yu Haoyi6,Gailevičius Darius7,Wang Hongtao1,Pan Cheng‐Feng1,Nair Parvathi Nair Suseela1,Ke Yujie1,Mori Tomohiro18,Chan John You En1,Ruan Qifeng9,Farsari Maria4,Malinauskas Mangirdas7,Juodkazis Saulius1011,Gu Min6,Yang Joel K. W.112ORCID

Affiliation:

1. Engineering Product Development Pillar Singapore University of Technology and Design 8 Somapah Road 487372 Singapore Singapore

2. National Engineering Research Center for High Efficiency Grinding, College of Mechanical and Vehicle Engineering Hunan University Changsha 410082 China

3. Greater Bay Area Institute for Innovation Hunan University Guangzhou 511300 China

4. IESL‐FORTH N. Plastira 100 Heraklion Crete 70013 Greece

5. Department of Material Science and Technology University of Crete Heraklion Crete 70013 Greece

6. Institute of Photonic Chips University of Shanghai for Science and Technology Shanghai 200093 China

7. Laser Research Center, Physics Faculty Vilnius University Vilnius LT‐10223 Lithuania

8. Industrial Technology Center of Wakayama Prefecture Wakayama 6496261 Japan

9. Ministry of Industry and Information Technology Key Lab of Micro‐Nano Optoelectronic Information System Harbin Institute of Technology (Shenzhen) Shenzhen 518055 China

10. Optical Sciences Centre, School of Science Swinburne University of Technology Hawthorn VIC 3122 Australia

11. WRH Program International Research Frontiers Initiative (IRFI) Tokyo Institute of Technology Nagatsutacho, Midori‐ku Yokohama Kanagawa 226‐8503 Japan

12. Institute of Materials Research and Engineering A*STAR (Agency for Science, Technology and Research) 2 Fusionopolis Way, #08‐03 Innovis Singapore 138634 Singapore

Abstract

AbstractThe rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced 3D printing techniques, two‐photon polymerization lithography (TPL) uniquely offers a significant advantage in nanoscale print resolution, and has been widely employed in diverse fields, for example, life sciences, materials sciences, mechanics, and microfluidics. More recently, by virtue of the optical transparency of most of the resins used, TPL is finding new applications in optics and photonics, with nanometer to millimeter feature dimensions. It enables the minimization of optical elements and systems, and exploration of light‐matter interactions with new degrees of freedom, never possible before. To review the recent progress in the TPL related optical research, it starts with the fundamentals of TPL and material formulation, then discusses novel fabrication methods, and a wide range of optical applications. These applications notably include diffractive, topological, quantum, and color optics. With a panoramic view of the development, it is concluded with insights and perspectives of the future development of TPL and related potential optical applications.

Funder

National Research Foundation Singapore

Science and Technology Commission of Shanghai Municipality

Postdoctoral Research Foundation of China

European Social Fund

Australian Research Council

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

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