Characterizing Patterned Block Copolymer Thin Films with Soft X-rays
Author:
Affiliation:
1. National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
2. Institute for Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
3. IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
Funder
National Institute of Standards and Technology
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.7b02791
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1. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
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4. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
5. Servo-Integrated Patterned Media by Hybrid Directed Self-Assembly
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