Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies-Reference-Cited by-同舟云学术

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Published:2018-03-19 Issue:15 Volume:10 Page:13158-13180
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Faraz Tahsin¹^ORCID,Knoops Harm C. M.¹²,Verheijen Marcel A.¹³,van Helvoirt Cristian A. A.¹,Karwal Saurabh¹^ORCID,Sharma Akhil¹,Beladiya Vivek⁴,Szeghalmi Adriana⁴⁵,Hausmann Dennis M.⁶,Henri Jon⁶,Creatore Mariadriana¹,Kessels Wilhelmus M. M.¹^ORCID

Affiliation:

1. Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. Oxford Instruments Plasma Technology, North End, Bristol, BS49 4AP, United Kingdom

3. Philips Innovation Services, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands

4. Friedrich Schiller University Jena, Albert-Einstein-Str. 13, 07745 Jena, Germany

5. Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany

6. Lam Research Corporation, 11155 SW Leveton Drive, Tualatin, Oregon 97062, United States

Funder

COST

DFG

NWO

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

http://pubs.acs.org/doi/pdf/10.1021/acsami.8b00183

Reference70 articles.

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5. Energy-enhanced atomic layer deposition for more process and precursor versatility

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