Surface Properties of Alkoxysilane Layers Grafted in Supercritical Carbon Dioxide
Author:
Affiliation:
1. ICSM, CEA, CNRS, ENSCM, Univ. Montpellier 30207 Bagnols-sur-Cèze, France
2. ICGM UMR5253, 34090 Montpellier Cedex 5, France
3. Institut Européen des Membranes, UMR CNRS 5635, CC047, Université de Montpellier, F-34095 Montpellier Cedex 5, France
Funder
Universit? de Montpellier
Commissariat ? l'?nergie Atomique et aux ?nergies Alternatives
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.8b03826
Reference55 articles.
1. Alkoxysilane Layers Compatible with Copper Deposition for Advanced Semiconductor Device Applications
2. Alkoxysilane layers deposited by SC CO2 process on silicon oxide for microelectronics applications
3. An overview of supercritical CO2 applications in microelectronics processing
4. Crosslinking impact of mesoporous MSQ films used in microelectronic interconnections on mechanical properties
5. Removal of Pb(II) ions from aqueous systems using thiol-functionalized cobalt-ferrite magnetic nanoparticles
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