Titanium Diboride Thin Films by Low-Temperature Chemical Vapor Deposition from the Single Source Precursor Ti(BH4)3(1,2-dimethoxyethane)-Reference-Cited by-同舟云学术

Titanium Diboride Thin Films by Low-Temperature Chemical Vapor Deposition from the Single Source Precursor Ti(BH4)3(1,2-dimethoxyethane)

Published:2007-06-30 Issue:15 Volume:19 Page:3802-3807
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Kumar Navneet¹,Yang Yu¹,Noh Wontae¹,Girolami Gregory S.¹,Abelson John R.¹

Affiliation:

1. Department of Materials Science and Engineering, University of Illinois at Urbana Champaign, 1304 West Green Street, Urbana, Illinois 61801, Department of Chemistry, University of Illinois at Urbana Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801, and Frederick Seitz Materials Research Laboratory, 104 South Goodwin Avenue, Urbana, Illinois 61801

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm070277z

Reference37 articles.

1. Material selection for hard coatings

2. Borides in Thin Film Technology

3. TiB2 and ZrB2 diffusion barriers in GaAs Ohmic contact technology

Cited by 40 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Early events in the mechanism of single-source chemical vapor deposition of zirconium and hafnium diboride: a computational investigation;Physical Chemistry Chemical Physics;2024

2. Synthesis and Characterization of Ether Adducts of Thorium Tetrahydroborate Th(BH₄)₄ and Chemical Vapor Deposition of Thorium Boride Thin Films;Inorganic Chemistry;2023-02-27

3. X-ray Crystal Structure of Thorium Tetrahydroborate, Th(BH4)4, and Computational Studies of An(BH4)4 (An = Th, U);Inorganic Chemistry;2021-08-04

4. Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition;Journal of Vacuum Science & Technology A;2021-03

5. Spectroscopic ellipsometry;Handbook of Modern Coating Technologies;2021