Borides in Thin Film Technology-Reference-Cited by-同舟云学术

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Borides in Thin Film Technology

Published:1997-10 Issue:1 Volume:133 Page:279-291
ISSN:0022-4596
Container-title:Journal of Solid State Chemistry
language:en
Short-container-title:Journal of Solid State Chemistry

Author:

Mitterer Christian

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference91 articles.

1. Preparation and properties of hard‐material layers for metal machining and jewelry

2. Decorative optical coatings

3. Sputter deposition of ultrahard coatings within the system Ti-B-C-N

4. Structure and properties of Ti-B-N coatings

Cited by 183 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Identification of a Stable B₂H₂ Intermediate in the Decomposition of Zr(BH₄)₄ on the Pd(111) Surface;The Journal of Physical Chemistry C;2024-07-22

2. Microstructure, mechanical properties and ultra-high temperature thermal stability of GdB6 ceramics fabricated by reactive spark plasma sintering;Journal of the European Ceramic Society;2024-06

3. Stable DC vacuum arc plasma generation from a 100 mm TiB2 cathode;Surface and Coatings Technology;2024-05

4. Hardness and fracture toughness enhancement in transition metal diboride multilayer films with structural variations;Materialia;2024-05

5. Pulsed-dc bias magnetron sputtered TiB2 ceramic coating;International Journal of Refractory Metals and Hard Materials;2024-04

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