Sub-10-nm Nanochannels by Self-Sealing and Self-Limiting Atomic Layer Deposition
Author:
Affiliation:
1. Department of Materials Science and Engineering, Seoul National University, Seoul 151-742, Korea
2. IBM. T. J. Watson Research Center, Yorktown Heights, New York 10598
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl100999e
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