High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications-Reference-Cited by-同舟云学术

High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications

Published:2014-11-20 Issue:23 Volume:6 Page:21389-21396
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Ferrarese Lupi F.¹,Giammaria T. J.¹,Volpe F. G.¹,Lotto F.¹,Seguini G.¹,Pivac B.²,Laus M.³,Perego M.¹

Affiliation:

1. Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Monza and Brianza, Italy

2. Institut Ruđer Bošković, Bijenička cesta 54, 10000 Zagreb, Croatia

3. Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ‘‘A. Avogadro’’, Viale T. Michel 11, 15121, Alessandria, Italy

Funder

NanoSci-European Research Area Consortium

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am506391n

Reference39 articles.

1. Nanoporous Membranes with Ultrahigh Selectivity and Flux for the Filtration of Viruses

2. Self-Assembled Block Copolymer Thin Films as Water Filtration Membranes

3. Conjugated Block Copolymer Photovoltaics with near 3% Efficiency through Microphase Separation

4. Block copolymers for photovoltaics

5. Block Copolymer Lithography

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