Local Manipulation of Skyrmion Nucleation in Microscale Areas of a Thin Film with Nitrogen-Ion Implantation

Author:

Zhao Yongkang1,Wang Junlin2,Xu Lianxin3,Yu Peiyue4,Hou Mingxuan1,Meng Fei1,Xie Shuai1,Meng Yufei1,Zhu Ronggui1,Hou Zhipeng3ORCID,Yang Meiyin4,Luo Jun4,Wu Jing25,Xu Yongbing25,Gao Xingsen3ORCID,Feng Chun1ORCID,Yu Guanghua1

Affiliation:

1. School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China

2. School of Integrated Circuits, Guangdong University of Technology, Guangzhou 510006, China

3. Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials and Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China

4. Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences (IMECAS), Beijing 100029, China

5. York-Nanjing International Center of Spintronics (YNICS), York University, York YO10 3LT, U.K.

Funder

Guangdong Science and Technology Department

Ministry of Science and Technology of the People's Republic of China

Youth Innovation Promotion Association of the Chinese Academy of Sciences

National Natural Science Foundation of China

Chinese Academy of Sciences

Beijing Laboratory of Metallic Materials and Processing for Modern Transportation, University of Science and Technology Beijing

Foshan City

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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