Reaction Mechanism of Chlorosiloxane Ring Formation from SiCl4 and O2
Author:
Affiliation:
1. Theoretische Chemie, Universität Hannover, Am Kleinen Felde 30, 30167 Hannover, Germany
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp014235o
Reference51 articles.
1. A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor
2. Mechanistic Studies of Chemical Vapor Deposition
3. First observation of strained siloxane bonds on silicon oxide thin films
4. Chemische Reaktionen bei der Herstellung von Lichtwellenleitern für die optische Datenfernübertragung
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2. Electron impact ionization of plasma important SiClX(X= 1–4) molecules: theoretical cross sections;Journal of Physics B: Atomic, Molecular and Optical Physics;2011-06-08
3. ChemInform Abstract: Reaction Mechanism of Chlorosiloxane Ring Formation from SiCl4 and O2;ChemInform;2010-05-19
4. The gas-phase reactions of SiCl4 and Si2Cl6 with CH3OH and C2H5OH: An investigation by mass spectrometry and matrix-isolation infrared spectroscopy;Physical Chemistry Chemical Physics;2004
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