Sputtering Deposition of P-Type SnO Films with SnO2 Target in Hydrogen-Containing Atmosphere-Reference-Cited by-同舟云学术

Sputtering Deposition of P-Type SnO Films with SnO2 Target in Hydrogen-Containing Atmosphere

Published:2014-07-18 Issue:16 Volume:6 Page:13724-13729
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Hsu Po-Ching¹,Hsu Chao-Jui¹,Chang Ching-Hsiang¹,Tsai Shiao-Po¹,Chen Wei-Chung¹,Hsieh Hsing-Hung²,Wu Chung-Chih¹

Affiliation:

1. Graduate Institute of Electronics Engineering, Graduate Institute of Photonics and Optoelectronics, Department of Electrical Engineering, and Innovative Photonics Advanced Research Center (i-PARC), National Taiwan University, Taipei, 10617, Taiwan

2. AU Optronics Corporation, Hsinchu Science Park, Hsinchu 300, Taiwan

Funder

Ministry of Science and Technology of Taiwan

Ministry of Education of Taiwan

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am5031787

Reference25 articles.

1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors