Chloride Molecular Doping Technique on 2D Materials: WS2 and MoS2-Reference-Cited by-同舟云学术

Chloride Molecular Doping Technique on 2D Materials: WS2 and MoS2

Published:2014-10-14 Issue:11 Volume:14 Page:6275-6280
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Yang Lingming¹,Majumdar Kausik²,Liu Han¹,Du Yuchen¹,Wu Heng¹,Hatzistergos Michael³,Hung P. Y.²,Tieckelmann Robert²,Tsai Wilman⁴,Hobbs Chris²,Ye Peide D.¹

Affiliation:

1. School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States

2. SEMATECH, Albany, New York 12203, United States

3. College of Nanoscale Science and Engineering, State University of New York at Albany, Albany, New York 12203, United States

4. Intel Corporation, Santa Clara, California 95054, United States

Funder

Semiconductor Research Corporation

SEMATECH, Inc.

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl502603d

Reference33 articles.

1. Atomically ThinMoS2: A New Direct-Gap Semiconductor

2. Two-dimensional atomic crystals

3. Electroluminescence in Single Layer MoS2

4. Stretching and Breaking of Ultrathin MoS2

5. Channel Length Scaling of MoS2MOSFETs

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