At the Gates: The Tantalum-Rich Phase Hf3Ta2O11 and its Commensurately Modulated Structure

Author:

Wiedemann Dennis1ORCID,Lüdtke Tobias1,Palatinus Lukáš2,Willinger Elena3,Willinger Marc G.3ORCID,Mühlbauer Martin J.4,Lerch Martin1ORCID

Affiliation:

1. Institut für Chemie, Technische Universität Berlin, 10623 Berlin, Germany

2. Institute of Physics, Czech Academy of Sciences, 18221 Prague 8, Czech Republic

3. Abteilung Anorganische Chemie, Fritz-Haber-Institut, 14195 Berlin, Germany

4. Heinz Maier-Leibnitz Zentrum (MLZ), Technische Universität München, 85747 Garching, Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

Reference40 articles.

1. Improved electrical and material characteristics of HfTaO gate dielectrics with high crystallization temperature

2. SciFinder; Chemical Abstracts Service: Columbus, OH, 2018; search for multi-component formulas; https://scifinder.cas.org (accessed July 20, 2018).

3. Baum, T. H.; Xu, C.; Paw, W.; Hendrix, B. C.; Roeder, J. F.; Wang, Z. Source Reagent Composition for CVD Formation of Zr/Hf Doped Gate Dielectric and High Dielectric Constant Metal Oxide Thin Films and Method of Using Same. US20020132048, September 19, 2002.

4. Phase equilibrium relations in the systems titania-niobia and zirconia-niobia

5. X-Ray Diffraction Study of New Hafnium Compounds

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