Magnetic Field-Assisted Chemical Vapor Deposition of UO2 Thin Films-Reference-Cited by-同舟云学术

Magnetic Field-Assisted Chemical Vapor Deposition of UO2 Thin Films

Published:2021-01-21 Issue:3 Volume:60 Page:1915-1921
ISSN:0020-1669
Container-title:Inorganic Chemistry
language:en
Short-container-title:Inorg. Chem.

Author:

Raauf Aida¹^ORCID,Leduc Jennifer¹^ORCID,Frank Michael¹^ORCID,Stadler Daniel¹^ORCID,Graf David¹^ORCID,Wilhelm Michael¹,Grosch Matthias¹,Mathur Sanjay¹^ORCID

Affiliation:

1. Department of Chemistry, Institute of Inorganic Chemistry, University of Cologne, Greinstrasse 6, 50939 Cologne, Germany

Funder

Deutsche Forschungsgemeinschaft

Evangelisches Studienwerk Villigst

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.inorgchem.0c03387

Reference42 articles.

1. Chemistry of Actinide Centers in Heterogeneous Catalytic Transformations of Small Molecules

2. Determination of the Insulation Gap of Uranium Oxides by Spectroscopic Ellipsometry and Density Functional Theory

3. Electronically Coupled Uranium and Iron Oxide Heterojunctions as Efficient Water Oxidation Catalysts

4. Surface reactions of uranium oxide powder, thin films and single crystals

5. Gelation of uranyl ions and gel-derived uranium oxide nanoparticles for gas sensing

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