ToF-SIMS Depth Profiling of PS-b-PMMA Block Copolymers Using Arn+, C60++, and Cs+ Sputtering Ions-Reference-Cited by-同舟云学术

ToF-SIMS Depth Profiling of PS-b-PMMA Block Copolymers Using Arn+, C60++, and Cs+ Sputtering Ions

Published:2017-06-15 Issue:13 Volume:89 Page:6984-6991
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Terlier T.¹²³^ORCID,Zappalà G.⁴,Marie C.¹²,Leonard D.³,Barnes J.-P.¹²,Licciardello A.⁴

Affiliation:

1. University Grenoble Alpes, F-38000 Grenoble, France

2. CEA, LETI, MINATEC Campus, F-38054 Grenoble, France

3. Univ Lyon, CNRS, Université Claude Bernard Lyon 1, ENS Lyon, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, France

4. Dipartimento di Scienze Chimiche, Università degli Studi di Catania and CSGI, Viale A. Doria 6, 95125 Catania, Italy

Funder

Minist?re de l'Enseignement Sup?rieur et de la Recherche

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.analchem.7b00279

Reference31 articles.

1. Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry

2. Molecular depth profiling of organic photovoltaic heterojunction layers by ToF-SIMS: comparative evaluation of three sputtering beams

3. C60 molecular depth profiling of bilayered polymer films using ToF-SIMS

4. Etching rate and structural modification of polymer films during low energy ion irradiation

5. Block Copolymer Nanostructures for Technology

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