Exceptional Light Sensitivity by Thiol–Ene Click Lithography-Reference-Cited by-同舟云学术

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Exceptional Light Sensitivity by Thiol–Ene Click Lithography

Published:2023-01-10 Issue:5 Volume:145 Page:3064-3074
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Wang Qianqian¹,Cui Hao¹,Wang Xiaolin¹,Hu Ziyu¹,Tao Peipei¹,Li Mingyang¹,Wang Jianlong¹^ORCID,Tang Yaping¹,Xu Hong¹^ORCID,He Xiangming¹^ORCID

Affiliation:

1. Institute of Nuclear and New Energy Technology, Tsinghua University, Beijing100084, China

Funder

Beijing Municipal Science and Technology Commission

Tsinghua University

National Natural Science Foundation of China

Administrative Commission of Zhongguancun Science Park

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/jacs.2c11887

Reference69 articles.

1. Microstructure Fabrication

2. Scalable submicrometer additive manufacturing

3. Direct Laser Writing of Four-Dimensional Structural Color Microactuators Using a Photonic Photoresist

4. Pushing the limits of lithography

5. From the bottom up: dimensional control and characterization in molecular monolayers

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