Novel Star Polymers as Chemically Amplified Positive-Tone Photoresists for KrF Lithography Applications-Reference-Cited by-同舟云学术

Novel Star Polymers as Chemically Amplified Positive-Tone Photoresists for KrF Lithography Applications

Published:2018-04-27 Issue:19 Volume:57 Page:6790-6796
ISSN:0888-5885
Container-title:Industrial & Engineering Chemistry Research
language:en
Short-container-title:Ind. Eng. Chem. Res.

Author:

Zheng Xiangfei¹^ORCID,Ji Changwei¹,Liu Jingcheng¹,Liu Ren¹^ORCID,Mu Qidao²,Liu Xiaoya¹

Affiliation:

1. The Key Laboratory of Synthetic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, No. 1800 Lihu Avenue, Wuxi, China

2. Suzhou Rui Hong Electronic Chemicals Co., Ltd., No. 501 Minfeng Road, Suzhou, China

Funder

Ministry of Education of the People's Republic of China

China Postdoctoral Science Foundation

Government of Jiangsu Province

Publisher

American Chemical Society (ACS)

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.iecr.7b05335

Reference39 articles.

1. Ito, H.; Willson, C. G.; Fréchet, J. M. J. New UV Resists with Negative or Positive Tone; Digest of Technical Papers; Symposium on VLSI Technology, 1982; pp 86–87.

2. Aromatic Monoazines as Fluorescent Sensors for Photoacid Generation in Thin Polymer Films

3. Chemical Amplification Resists for Microlithography

4. Molecular Glass Resists for High-Resolution Patterning

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