Aromatic Monoazines as Fluorescent Sensors for Photoacid Generation in Thin Polymer Films
Author:
Affiliation:
1. Department of Chemistry, University of Ottawa, Ottawa, Ontario, K1N 6N5, Canada
2. Shipley Company Research and Development Laboratories, 455 Forest Street, Marlborough, Massachusetts 01752-3092
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm960186u
Reference20 articles.
1. Reiser, A.Photoreactive Polymers: The Science and Technology of Resists; John Wiley and Sons: New York, 1989; p 409.
2. Highly-sensitive novolak-based positive X-ray resist
3. The role of the latent image in a new dual image, aqueous developable, thermally stable photoresist
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