Treatment of Azole-Containing Industrial Wastewater by the Fenton Process-Reference-Cited by-同舟云学术

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Treatment of Azole-Containing Industrial Wastewater by the Fenton Process

Published:2021-06-29 Issue:27 Volume:60 Page:9716-9728
ISSN:0888-5885
Container-title:Industrial & Engineering Chemistry Research
language:en
Short-container-title:Ind. Eng. Chem. Res.

Author:

Li Rui¹²,Siriwardena Dinusha³,Speed David⁴,Fernando Sujan²,Holsen Thomas M.²⁵^ORCID,Thagard Selma Mededovic¹^ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering, Clarkson University, Potsdam, New York 13699, United States

2. Center for Air and Aquatic Resources Engineering & Science, Clarkson University, Potsdam, New York 13699, United States

3. Institute for a Sustainable Environment, Clarkson University, Potsdam, New York 13699, United States

4. GLOBALFOUNDRIES U.S. Inc., Hopewell Junction, New York 12533, United States

5. Department of Civil and Environmental Engineering, Clarkson University, Potsdam, New York 13699, United States

Funder

GLOBALFOUNDRIES U.S. Inc

Publisher

American Chemical Society (ACS)

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.iecr.1c00976

Reference64 articles.

1. Waste Generation and Minimization in Semiconductor Industry

2. Electrocoagulation of chemical mechanical polishing (CMP) wastewater from semiconductor fabrication

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