Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer
Author:
Affiliation:
1. The Dow Chemical Company, 455 Forest Street, Marlborough, Massachusetts 01752, United States
2. The Dow Chemical Company, 400 Arcola Road, Collegeville, Pennsylvania 19426, United States
Funder
Dow Chemical Company
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.5b04602
Reference74 articles.
1. Fundamental Principles of Optical Lithography
2. Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes
3. Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up
4. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
5. Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
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