Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2-Reference-Cited by-同舟云学术

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Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2

Published:2019-06-12 Issue:13 Volume:31 Page:4793-4804
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Song Seung Keun¹^ORCID,Saare Holger¹,Parsons Gregory N.¹^ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering, North Carolina State University, Raleigh, North Carolina 27695, United States

Funder

Semiconductor Research Corporation

Division of Chemical, Bioengineering, Environmental, and Transport Systems

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.9b01143

Reference71 articles.

1. Selective epitaxy growth of Si1−xGex layers for MOSFETs and FinFETs

2. Dependence of Cu electromigration resistance on selectively deposited CVD Co cap thickness

3. Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

4. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition

5. The use of atomic layer deposition in advanced nanopatterning

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2. Area Selective Deposition of Ru on W/SiO₂ Nanopatterns via Sequential Reactant Dosing and Thermal Defect Correction;Chemistry of Materials;2024-06-11

3. Area selective deposition for bottom-up atomic-scale manufacturing;International Journal of Machine Tools and Manufacture;2024-06

4. Selective growth of vanadium dioxide on patterned Al/SiO₂ substrates by metal–organic chemical vapor deposition;CrystEngComm;2024

5. Machine Learning Modeling and Run-to-Run Control of an Area-Selective Atomic Layer Deposition Spatial Reactor;Coatings;2023-12-27

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