Surface-Inhibiting Effect in Chemical Vapor Deposition of Boron–Carbon Thin Films from Trimethylboron
Author:
Affiliation:
1. Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden
Funder
Link?pings Universitet
Stiftelsen f?r?Strategisk Forskning
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.9b00492
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