Conformal Deposition of Conductive Single-Crystalline Cobalt Silicide Layer on Si Wafer via a Molecular Approach-Reference-Cited by-同舟云学术

Conformal Deposition of Conductive Single-Crystalline Cobalt Silicide Layer on Si Wafer via a Molecular Approach

Published:2018-02-21 Issue:6 Volume:30 Page:2168-2173
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lin Tsung-Han¹,Margossian Tigran¹,Zheng Li-Qing¹,Kumar Sudhir¹^ORCID,Marozau Ivan²,Sereda Olha²,Zemlyanov Dmitry³,Shih Chih-Jen¹^ORCID,Zenobi Renato¹,Baudouin David¹,De Micheli Giovanni⁴,Gaillardon Pierre-Emmanuel⁵,Copéret Christophe¹^ORCID

Affiliation:

1. Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir-Prelog-Weg 1-5, CH-8093 Zürich, Switzerland

2. CSEM SA, Jaquet-Droz 1, CH-2002 Neuchâtel, Switzerland

3. Brick Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907-2057, United States

4. Department of Electrical Engineering, EPF Lausanne, CH-1015 Lausanne, Switzerland

5. Department of Electrical and Computer Engineering, University of Utah, Salt Lake City, Utah 84112, United States

Funder

Schweizerischer Nationalfonds zur F?rderung der Wissenschaftlichen Forschung

Division of Electrical, Communications and Cyber Systems

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.8b00701

Reference32 articles.

1. Saving Moore’s Law Down To 1 nm Channels With Anisotropic Effective Mass

2. Sub-10 nm Carbon Nanotube Transistor

3. Is Silicon's Reign Nearing Its End?

4. High-Performance Complementary Transistors and Medium-Scale Integrated Circuits Based on Carbon Nanotube Thin Films

5. Roadmap for 22nm and beyond (Invited Paper)

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