Selective Growth of Titanium Nitride on HfO2 across Nanolines and Nanopillars-Reference-Cited by-同舟云学术

Selective Growth of Titanium Nitride on HfO2 across Nanolines and Nanopillars

Published:2016-07-11 Issue:14 Volume:28 Page:4928-4934
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Chopra Sonali N.¹,Zhang Zizhuo¹,Kaihlanen Chris¹,Ekerdt John G.¹

Affiliation:

1. McKetta Department of Chemical Engineering, The University of Texas at Austin, 200 East Dean Keeton Street, Stop C0400, Austin, Texas 78712, United States

Funder

Division of Graduate Education

Division of Engineering Education and Centers

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.6b01036

Reference52 articles.

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3. Atomic layer deposition (ALD): from precursors to thin film structures

4. Atomic layer epitaxy - a valuable tool for nanotechnology?

5. Atomic Layer Deposition: An Overview

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