Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO<sub>2</sub>-Reference-Cited by-同舟云学术

Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO₂

Published:2023-01-03 Issue:2 Volume:35 Page:529-538
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

D’Acunto Giulio¹^ORCID,Tsyshevsky Roman²,Shayesteh Payam¹,Gallet Jean-Jacques³⁴^ORCID,Bournel Fabrice³⁴^ORCID,Rochet François³^ORCID,Pinsard Indiana¹,Timm Rainer¹^ORCID,Head Ashley R.⁵^ORCID,Kuklja Maija²,Schnadt Joachim¹⁶^ORCID

Affiliation:

1. Department of Physics, Division of Synchrotron Radiation Research, and NanoLund, Lund University, Box 118, 221 00 Lund, Sweden

2. Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742, United States

3. CNRS Laboratoire de Chimie Physique-Matière et Rayonnement, Sorbonne Université, 4 place Jussieu, 75005 Paris, France

4. Synchrotron SOLEIL, L’Orme des Merisiers, Saint-Aubin, BP 48, 91192 Gif-sur-Yvette Cedex, France

5. Center for Functional Nanomaterials, Brookhaven National Laboratory, P.O. Box 5000, Upton, New York 11973-5000, United States

6. MAX IV Laboratory, Lund University, Box 118, 221 00 Lund, Sweden

Funder

Vetenskapsr?det

National Energy Research Scientific Computing Center

Division of Materials Research

NanoLund, Lund University

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.2c02947

Reference61 articles.

1. A brief review of atomic layer deposition: from fundamentals to applications

2. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

3. The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

4. Mechanisms of surface reactions in thin solid film chemical deposition processes

5. Understanding chemical and physical mechanisms in atomic layer deposition

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Growth mechanism of HfO2 film on H-terminated Si (100) surface from atomic layer deposition process using tetrakis(ethylmethylamino)hafnium;Surfaces and Interfaces;2024-10

2. Adsorption of dimethylaluminum isopropoxide (DMAI) on the Al2O3 surface: A machine-learning potential study;Journal of Science: Advanced Materials and Devices;2024-09

3. Chemisorption of tetrakis(dimethylamino)zirconium on zirconium oxide: Density functional theory study;Surfaces and Interfaces;2024-07

4. Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111);Journal of Vacuum Science & Technology A;2024-02-28

5. Towards modeling of ZrO2 atomic layer deposition at reactor scale based on experimental kinetic approximation;Applied Surface Science;2024-02