The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces-Reference-Cited by-同舟云学术

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The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

Published:2018-02-28 Issue:3 Volume:51 Page:800-809
ISSN:0001-4842
Container-title:Accounts of Chemical Research
language:en
Short-container-title:Acc. Chem. Res.

Author:

Barry Seán T.¹^ORCID,Teplyakov Andrew V.²^ORCID,Zaera Francisco³^ORCID

Affiliation:

1. Department of Chemistry, Carleton University, Ottawa, Ontario K1S 5B6, Canada

2. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, United States

3. Department of Chemistry, University of California, Riverside, California 92521, United States

Funder

Division of Chemistry

Basic Energy Sciences

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

General Medicine,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.accounts.8b00012

Reference61 articles.

1. Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies

2. Advances in the deposition chemistry of metal-containing thin films using gas phase processes

3. Atomic Layer Deposition: An Overview

4. The use of atomic layer deposition in advanced nanopatterning

5. Recent Advances in Chemical Vapor Deposition

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