Parallel Arrays of Sub-10 nm Aligned Germanium Nanofins from an In Situ Metal Oxide Hardmask using Directed Self-Assembly of Block Copolymers-Reference-Cited by-同舟云学术

Parallel Arrays of Sub-10 nm Aligned Germanium Nanofins from an In Situ Metal Oxide Hardmask using Directed Self-Assembly of Block Copolymers

Published:2015-08-19 Issue:17 Volume:27 Page:6091-6096
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Cummins Cian¹,Gangnaik Anushka²,Kelly Roisin A.²,Hydes Alan J.³,O’Connell John²,Petkov Nikolay²,Georgiev Yordan M.²,Borah Dipu¹,Holmes Justin D.²⁴,Morris Michael A.¹⁴

Affiliation:

1. Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland

2. Materials Chemistry and Analysis Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland

3. SP&S, Tyndall National Institute, University College Cork, Cork, Ireland

4. AMBER, Trinity College Dublin, Dublin, Ireland

Funder

Seventh Framework Programme

Science Foundation Ireland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.5b02608

Reference44 articles.

1. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

2. Self-assembly of block copolymers

3. Functional Block Copolymers: Nanostructured Materials with Emerging Applications

4. Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large

5. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

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