Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based Precursor-Reference-Cited by-同舟云学术

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Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based Precursor

Published:2022-03-02 Issue:6 Volume:34 Page:2576-2584
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Ha Min-Ji¹,Kim Hyunchang²,Choi Jeong-Hun¹,Kim Miso³,Kim Woo-Hee¹^ORCID,Park Tae Joo¹^ORCID,Shong Bonggeun³^ORCID,Ahn Ji-Hoon¹^ORCID

Affiliation:

1. Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea

2. iChems Co., Ltd., 73 Banjeong-ro, Hwaseong 18374, Republic of Korea

3. Department of Chemical Engineering, Hongik University, Seoul 04066, Republic of Korea

Funder

National Research Foundation of Korea

Korea Evaluation Institute of Industrial Technology

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.1c03607

Reference63 articles.

1. Atomic layer deposition of metals: Precursors and film growth

2. The search for the most conductive metal for narrow interconnect lines

3. Exploring Alternative Metals to Cu and W for Interconnects Applications Using Automated First-Principles Simulations

4. The effect of deposition parameters and substrate surface condition on texture, morphology and stress in magnetron-sputter-deposited Cu thin films

5. The Effect of Annealing Temperatures on Self-Aligned Replacement (Damascene) TaCN–TaN-Stacked Gate pMOSFETs

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1. Atomic Layer Deposition of Molybdenum Carbide Thin Films;Advanced Materials Interfaces;2024-07

2. Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction;Journal of Vacuum Science & Technology A;2024-06-25

3. Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor;Journal of Vacuum Science & Technology A;2024-03-27

4. The effect of C2H2 addition to (cyclopentadienyl) molybdenum (dicarbonyl) (nitrosyl) complex gas system for the tribological property of MoCx/a-C:H films on bearing materials;Tribology International;2024-03

5. Synthesis and Volatility Characterization of Mo(II) and W(II) Compounds for Thin Films;Inorganic Chemistry;2023-10-03

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